Tel : +86-592-3926659
Email : gilia@inthelaboratory.com
Lab Small High Vacuum Magnetron Sputtering Coater with
Room Temperature to 500C
I. Product Overview
1. Applicable: universities and colleges, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.
2. Product features/uses:
► Small footprint, inexpensive, stable performance, low cost of use and maintenance;
► can be used for the preparation of single-layer and multi-layer metal film, dielectric film, magnetic film, sensor film and heat-resistant alloy film, hard film, corrosion-resistant film, etc.;
► coating examples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silicon dioxide, etc;
► single target sputtering, multi-target sequential sputtering, common sputtering and other functions.
II. Technical parameters
|
Model |
JCP500 |
|
Vacuum chamber structure |
Vertical front door structure, rear extraction system |
|
Vacuum chamber size |
Φ500×H420mm |
|
Heating temperature |
Room temperature～500℃ |
|
Sputtering method |
Upper and lower sputtering optional |
|
Rotating substrate table |
Φ150mm |
|
Film thickness non-uniformity |
Φ100mm range ≤±5.0% |
|
Sputtering target/evaporation electrode |
Φ3 inch magnetron target 3pcs, compatible with DC/MF/RF sputtering |
|
Process gas |
2~3 way gas flow control |
|
Control method |
PLC+touch screen human-machine interface semi-automatic control system |
|
Floor space |
(Main machine) L1900×W800×H1900mm |
|
Total power |
≥10KW |
IPv6 network supported 