Split Type Single Target Magnetron Coating Coater Machine
with Quartz Vacuum Cavity
Introduction
This equipment is a single-target magnetron coater, which can be used for the preparation of metal thin films, and has applications in the field of electronics, optics, special ceramic preparation, etc. It can also be used for laboratory SEM sample preparation.
This set of configuration uses quartz vacuum cavity, the coating process omnidirectional visualization, easy to observe and record the experiment, the cavity design is convenient to open, easy to clean, very suitable for laboratory use. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the uniformity of the film and the quality of film formation. The whole machine adopts modular design, with simple operation logic and intuitive operation interface, which is easy to get started.
The vacuum acquisition system of the equipment adopts two-stage vacuum pump set, the front pump is a large pumping speed mechanical pump, which can effectively reduce the time from atmospheric pressure to low vacuum, and the main pump is a turbo molecular pump, with high pumping speed and faster vacuum acquisition. The overall vacuum acquisition system is clean and fast.
Technical parameters
Sample Stages |
Size |
150mm |
Heating temperature |
≤500℃ |
|
Rotation speed |
1-20r/min |
Temperature control precision |
±1℃ |
Magnetron sputtering head |
Number |
2 inches x1 |
Cooling method |
Water cooling |
Vacuum chamber
|
Cavity size |
φ270mm X 200mm |
Observation window |
Omni-directional visibility |
Chamber material |
High purity quartz |
Open mode |
Removable top cover |
|
Vacuum System
|
Mechanical pump |
CY240 |
Pumping interface |
KF16 |
Pumping rate |
1.1L/s |
|
|
|
Molecular pump |
CY600 |
Pumping interface |
KF40 |
|
Pumping rate |
600L/s |
Exhaust port |
KF40 |
|
Vacuum measurement |
Resistance gauge + ionization gauge |
|
|
|
Ultimate vacuum |
10-5Pa order of magnitude |
Power supply |
AC;220V 50/60Hz |
|
Power supply configuration |
Number of DC power supplies |
1 pc |
Output power |
≤500W |
Output voltage |
≤600V |
Response Time |
<5ms |
|
Number of RF power supplies |
1 set |
Output power |
≤1000W |
|
Power Stability |
≤5W |
|
|
|
Film thickness monitoring system
|
Film thickness meter measurement resolution |
±0.03Hz |
Measurement Accuracy |
±0.5% |
Measurement upper limit |
50000 |
Measurement speed |
100~1000ms |
|
Water Cooling System |
Tank volume |
9L |
Flow rate |
10L/min |
Others |
Supply voltage |
AC220V,50Hz |
Whole machine power |
3kw(Host + Vacuum Pump) |