Tel : +86-592-3926659
Email : gilia@inthelaboratory.com
Lab High Vacuum Magnetron Sputtering Coater Coating Machine
I. Product Overview
1. Applicable: universities and colleges, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.
2. Product features/uses:
► Small footprint, cheap price, stable performance and low cost of use and maintenance;
► Can be used to prepare single-layer and multi-layer metal film, dielectric film, magnetic film, sensor film and heat-resistant alloy film, hard film, corrosion-resistant film, etc;
► Coating examples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silicon dioxide, etc;
► Single-target sputtering, multi-target sequential sputtering, common sputtering and other functions.
II. Technical parameters
|
Model |
JCPY500 |
|
Vacuum chamber structure |
Vertical front door structure, rear extraction system, double-layer water cooling |
|
Vacuum chamber size |
Φ500×H450mm, with Load-Lock function, support single or multi-piece into the sample |
|
Heating temperature |
Room temperature～500℃ |
|
Sputtering method |
Upward sputtering |
|
Rotating substrate table |
Φ150mm |
|
Film thickness non-uniformity |
Φ100mm range ≤±5.0% |
|
Sputtering target/evaporation electrode |
Φ3, Φ4 inch magnetron target 2-4 optional |
|
Process gas |
3-way gas flow control |
|
Control method |
PLC+touch screen human-machine interface semi-automatic control system |
|
Floor space |
(Main machine) L1800×W800×H1845mm |
|
Total power |
≥15KW |
IPv6 network supported 