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DC Double Target Magnetic Controlled Coater Coating Instrument

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    LITH-MC
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
  • Product Detail

DC Double Target Magnetic Controlled Coater Coating Instrument

  

 

Dual-target magnetron sputtering coating meter

The two-target magnetron sputtering coating instrument is developed by a small laboratory with two targets, which can be used in the preparation of single or multi-layer iron film, conductive film, alloy film, semiconductor film, ceramic film, medium film, optical film, etc.The magnetic control sputtering is compared to the normal plasma sputtering has the advantage of high energy speed, high coating speed, low temperature rise, typical high temperature and low temperature sputtering. The magnetic control target is equipped with water-cooled interlayer, the water cooling function is enough to take the heat away, avoid the heat in the target surface, and make the magnetic control coating can work for a long time.Compared with similar equipment, this two-target sputtering film is not only widely used, but also is a good device for preparing films.

 

Technical parameters:

Project

Detail

Supply voltage

AC220V50Hz

Machine power

3KW

Ultimate vacuum

10-6torr

Loading platform parameters

 

Dimension

φ140mm

Heating temperature

Max.500℃

Temperature control accuracy

±1℃

Speed technical parameters:

1-20rpm adjustable

Magnetron sputtering head parameters

 

Quantity

2*2" magnetron sputter head

Cooling mode

Water cooling, required velocity 10l/min

Specification of water cooler

The circulating water cooling machine of 16l/min velocity

Vacuum chamber

Cavity size

φ300mm X 300mm H

Cavity material

Stainless steel

Viewing window

φ100mm

Opening mode

Top open, easy to replace target material

Gas flow controller

The four paths are n2, aro2, air;

The range is 0-500sccm

Vacuum pump

Equipped with a set of molecular pump system, pumping 600l/s

Film thickness meter

Quartz vibrating film thickness gauge, Resolution 0.10

Sputtering power supply

Dc power supply, 500W, suitable for preparing metal film

One RF power supply, 300W, suitable for non-metal coating

Mode of operation

Panel button operation

Overall size

1400mm X 750mm X 1300mm

Machine weight

300kg

DC Magnetic Controlled Coater


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