Tel : +86-592-3926659
Email : gilia@inthelaboratory.com
Small Single Target Plasma Sputter Coater Sputtering Coating Machine
Introduction
Single target plasma sputter coater is a cost effective plasma sputter coater developed by our company, which has the advantages of compact structure, easy to use, high integration and strong design sense. The plasma sputtering target is a standard size of 2 inches, and customers can choose different configurations of 1~3 targets according to their needs to meet different experimental requirements for plating single-layer films or multi-layer films of various materials. The instrument is equipped with a 150W DC high voltage power supply, which can be used for metal sputtering coating, especially for gold, silver, copper and other precious metals. The coating instrument is equipped with a venting interface for protective gas, if the customer needs to pass into the gas mixture, you can contact the staff to configure their own high-precision mass flow meter to meet the experimental needs.
Application
Can be used for metal sputtering coating, especially suitable for gold, silver, copper and other metals coating.
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Main technical parameters |
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Sample table |
Size |
Φ138mm |
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Heating temperature |
Maximum 500℃ |
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Temperature control accuracy |
±1℃ |
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Rotation speed |
1-20rpm adjustable |
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Plasma sputtering head |
1 x 2" plasma target |
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Vacuum chamber |
Cavity size |
Φ180mm×150mm |
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Cavity material |
High purity quartz |
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Viewing window |
Omnidirectional transparent |
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Opening method |
Top cover removal type |
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Front pole pump |
VRD-4 |
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Pumping rate |
Rotary vane pump：1.1L/S |
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Ultimate vacuum |
1.0E-1Pa |
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Pumping interface |
KF16 |
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Exhaust connection |
KF16 |
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Vacuum measurement |
Digital vacuum gauge |
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Others |
Supply voltage |
AC220V,50Hz |
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Whole machine power |
800W |
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Sputtering vacuum |
20Pa |
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Whole machine size |
Length 360mmWidth 300mmHeight 470mm |
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Weight of the whole machine |
30Kg |
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IPv6 network supported 