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Small High Vacuum Magnetron Sputtering and Evaporation Coater with PLC Touch Screen Control

Contact Person:Gilia Ding


Email: gilia@inthelaboratory.com

Tel:+86 177 5900 4070
Telephone:+86-177-59004070
Whatsapp: +86 177 5900 4070
Wechat:Dingqiuna



  • Item no.:

    LITH-JCP200
  • Payment:

    L/C, T/T, Western Union, Credit Cards, Paypal
  • Lead Time:

    7 days
  • Compliance:

    CE Certified
  • Warranty:

    Two years limited standard warranty
  • Product Detail

Small High Vacuum Magnetron Sputtering and Evaporation Coater with PLC Touch Screen Control 

  

 

I. Equipment overview

1. Applicable: universities and colleges, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.

2. Product features/uses:

► Equipment can be used for both sputtering/evaporation; small footprint, inexpensive, stable performance, low cost of use and maintenance;

► It can be used to prepare single-layer and multi-layer metal films, dielectric films, magnetic films, sensor films and heat-resistant alloy films, hard films, corrosion-resistant films, etc;

► Coating examples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silicon dioxide, etc;

► Single-target sputtering, multi-target sequential sputtering, common sputtering and other functions.

 

II. Technical parameters

Model

JCP200

Vacuum chamber structure

Vertical top-opening lid structure, lower extraction system, manual gas spring lifting open type

Vacuum chamber size

Φ220×H300mm

Heating temperature

Room temperature500℃

Sputtering method

Upward sputtering

Rotating substrate table

Φ100mm

Film thickness non-uniformity

Within Φ50mm≤±5.0%

Sputtering target/evaporation electrode

1 Φ2 inch magnetron target, compatible with DC/RF sputtering

Process gas

1-2 way gas flow control

Control method

PLC touch screen control

Floor space

(Host) L600×W800×H1700mm

Total power

≥6KW


Sputtering Coater



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